Lithography

Self-Assembly

Nanoshpere Lithography

200 - 1000 nm

Block Copolymer Self-Assembly

10 - 70 nm

Micro- & Nano lithography

Focused Ion Beam

Dualbeam FEI Quanta3D FEG - "FIB"

Electron-Beam Lithography

Dualbeam FEI Quanta3D FEG & Inspect F

e-learning module 1

Conventional Lithography

Laser writer

Heidelberg Laser Writer uPG101

Mask Aligner

Mask Alinger Karl Suss MJB3

e-learning module 2