200 - 1000 nm
10 - 70 nm
Focused Ion Beam
Dualbeam FEI Quanta3D FEG - "FIB"
Electron-Beam Lithography
Dualbeam FEI Quanta3D FEG & Inspect F
Laser writer
Heidelberg Laser Writer uPG101
Mask Aligner
Mask Alinger Karl Suss MJB3