Fabrication of devices and structures ranging from micro to nano-scale (UV-lithography, laser writer lithography, electron beam lithography, focused ion beam, self-assembly)

Thin films technologies (molecular beam epitaxy, evaporation, sputtering, ion milling, reactive ion etching, plasma enhanced chemical vapor deposition)

Electrical and optical characterization of devices and materials (e.g. superconductive, and memristive devices, nanostructured and low-dimensional materials)

Morphological and chemical characterization (atomic force microscopy, optical profilometer, ellipsometry, analytical scanning electron microscopy, Raman spectrometer, energy dispersive x-ray analysis).